Polarized film surface activation clean plasma technology process plasma cleaning machine improves product quality
Category:
Environmental Protection/Cleaning and cleaning equipment/Cleaning machine
Model:
CRF-VPO-4L-S
Brand:
CRF/Chengfeng Intelligent Manufacturing
Retail Price
45,000.00USD
重量
kg
- Product Description
-
Description :

The plasma cleaning machine is a small vacuum equipment with customizable processing space to improve processing capacity. It adopts a PLC+touch screen control system to effectively control the operation of the equipment;
We can customize the device cavity capacity and number of layers according to customer requirements to meet their needs;
Low maintenance and repair costs, facilitating customer cost control; High precision, fast response, good handling and compatibility, complete functions and technical support.
Plasma cleaning machine, suitable for the printed circuit board industry, semiconductor IC field, silicone, plastic, polymer field, automotive electronics industry, aviation industry, etc. Printed circuit board industry: high-frequency board surface activation, multi-layer board surface cleaning and de drilling, soft board and soft hard bonding board surface cleaning and de drilling, activation before soft board reinforcement. Semiconductor IC field: COB, COG, COF, ACF processes, used for cleaning before wire bonding and soldering; Plasma surface roughening, etching, and activation of silicone, plastics, and polymers in the field of silicone, plastics, and polymers.
A vacuum plasma cleaning machine uses plasma formed by gas ionization to perform surface treatment on product workpieces, whether for cleaning or surface activation. In order to achieve better treatment results, different processing gases need to be selected for different products. Common processing gases for plasma cleaning machines include oxygen (O2), argon (Ar), nitrogen (N2), compressed air (CDA), carbon dioxide (CO2), hydrogen (H2), carbon tetrafluoride (CF4), etc.








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Key words:- Plasma cleaning machine
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